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李亚巍

物理与电子科学学院      

个人资料

  • 部门: 物理与电子科学学院
  • 毕业院校:
  • 学位:
  • 学历:
  • 邮编:
  • 联系电话: +86-21-54345123
  • 传真:
  • 电子邮箱: ywli@ee.ecnu.edu.cn
  • 办公地址: 信息楼222室
  • 通讯地址: 上海市东川路500号 邮编:200241

教育经历

工作经历

个人简介

社会兼职

研究方向

原型器件及制造工艺

 

  • 铁电、阻变等新型功能器件

 

  • 介质层淀积工艺


开授课程

科研项目

学术成果

参编专著

Y.W. Li‚ Z.G. Hu‚ and J.H. Chu‚ Electrical processes in polycrystalline BiFeO3 film‚ Ferroelectrics - Characterization and Modeling edited by Mickael Lallart‚ Chapter 8‚ page: 135-152‚ ISBN: 978-953-307-455-9 (INTECH Open Access Publishers‚ Vienna‚ 2011).


专利申请及授权

李亚巍,乔琦,褚君浩,一种氧化铋薄膜的制备方法,专利号:201410726713.6,授权时间:2014.12

沈育德,李亚巍,褚君浩,一种针状蘑菇状Bi2O3 纳米材料的制备方法, 专利号:201110140208X,授权时间: 2012.11


近期代表性文章


    1. J. Z. Li, N. F. Mao, X. Li, F. F. Li, Y. W. Li*, K. Jiang, Z. G. Hu, and J. H. Chu, "Controllable fabrication of Bi2O3 nanoparticles by atomic layer deposition on TiO2 films and application in photodegradation", Solar Energy Materials & Solar Cells, 204, 110218 (2020).

    2. X. Li, J. Z. Li, Q. Qiao, F. Wang, Y. W. Li*, Z. G. Hu, and J. H. Chu, "Electrical characteristics and carrier injection mechanisms of atomic layer deposition synthesized n-SnO2/p-Si heterojunction", Mater. Res. Express, 6, 035909 (2018).

    3. Q. Qiao, D. Xu, Y. W. Li*, J. Z. Zhang, Z. G. Hu, and J. H. Chu, "Detection of resistive switching behavior based on the Al2O3/ZnO/Al2O3 structure with alumina buffers", Thin Solid Films, 623, 8 (2017).

    4. Q. Qiao, Y. W. Li*, J. Z. Zhang, Z. G. Hu, and J. H. Chu, "Experimental investigations of the bismuth oxide film grown by atomic layer deposition using triphenyl bismuth", Thin Solid Films, 622, 65 (2017).

    5. Y. W. Li*, Q. Qiao, Z. Dong, J. Z. Zhang, Z. G. Hu, and J. H. Chu, "Enhanced dielectric properties in bismuth-doped alumina films prepared by atomic layer deposition", Journal of Non-Crystalline Solids, 443, 17 (2016).

    6. Y. W. Li*, Q. Qiao, J. Z. Zhang, Z. G. Hu, and J. H. Chu, "Influence of post-annealing on structural, electrical and optical properties of manganese oxide thin films grown by atomic layer deposition", Thin Solid Films, 574, 115 (2015).

    7. Y. D. Shen, Y. W. Li*, W. M. Li, J. Z. Zhang, Z. G. Hu, and J. H. Chu, "Growth of Bi2O3 Ultrathin Films by Atomic Layer Deposition", J. Phys. Chem. C, 116, 3449 (2012).

    8. Y. W. Li*, Y. D. Shen, F. Y. Yue, Z. G. Hu, X. M. Ma, and J.H. Chu, "Preparation and characterization of BiFeO3/LaNiO3 heterostructure films grown on silicon substrate", J. Cryst. Growth, 312, 617 (2010).

    9. Y. W. Li*‚ Z. G. Hu‚ F. Y. Yue‚ W. Z. Zhou‚ P. X. Yang‚ and J. H. Chu‚ "Effects of deposition temperature and post-annealing on structure and electrical properties in (La0.5Sr0.5)CoO3 films grown on silicon substrate"‚ Appl. Phys. A.‚95‚ 721 (2009).

    10. Y. W. Li*‚ Y. D. Shen‚ Z. G. Hu‚ F. Y. Yue‚ and J. H. Chu‚ "Effect of thickness on the dielectric property and nonlinear current-voltage behavior of CaCu3Ti4O12 thin films"‚ Phys. Lett. A.373‚ 2389 (2009).

荣誉及奖励

招生信息

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